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Sapphire Wafers — 50.8mm to 200mm, C/R/M/A Orientation, DSP/SSP

12inch 300mm DSP Dummy Grade Silicon Wafer

8inch 200mm SSP/DSP Dummy Grade Silicon Wafer

6inch 150mm SSP Silicon Dummy Wafer

4inch 100mm SSP Silicon Dummy Wafer

12inch 300mm Thermal Oxide Silicon Wafer

8inch 200mm SiO2 Silicon Oxide Wafer

6inch 150mm Thermal Oxide Silicon Wafer

4inch SiO2 Wafer 100mm Silicon Oxide Wafer

12inch 300mm DSP Test Grade silicon wafer

0102030405

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8-Inch 200mm Silicon Oxide Wafer - High-Quality Wafer Suppliers and Factory in China

The **8-inch Silicon Oxide Wafer** is specially designed for production environments in China that demand exceptional film quality and consistency. Our wafers utilize a controlled thermal oxidation process to ensure uniform oxide growth across the entire surface, making them perfect for applications in CMOS, photonics, and MEMS integration. This advanced Silicon Dioxide Wafer supports intricate device layering and precise dielectric interfaces. Manufactured in our state-of-the-art factory, each wafer undergoes thorough inspection to ensure reliability and performance. As trusted suppliers, we offer a lead time of approximately 2 to 4 weeks, ensuring timely delivery for your projects

Product Detail

Core Highlights

Uniform oxidation across 200mm SiO2 Wafer.

Optimized for CMOS and photonics device fabrication.

Low defect density and high insulation performance.

Stable Oxidized Silicon Substrate for multilayer processes.

Typically ships within 2–4 weeks.

Technical Specifications

Diameter	8 inch (200 mm)
Oxide Thickness	50–20000A
Oxide Type	Dry/Wet Thermal Oxide
Substrate	Prime Grade Silicon
Surface	Double Side Polished (DSP) optional
Resistivity	Specified upon order

Frequently Asked Questions (FAQ)

1. What is the typical lead time for 200mm SiO2 Wafers?

Our typical shipping window is within 2 to 4 weeks depending on the customized specifications of your order.

2. Can I choose between Dry and Wet Thermal Oxidation?

Yes, we offer both Dry and Wet Thermal Oxide processes to fit your specific device fabrication requirements.

3. What ranges of oxide thickness do you provide?

We support custom oxide thicknesses ranging from thin layers of 50Å up to thick layers of 20000Å.

4. Is the Double Side Polished (DSP) option available?

Yes, Double Side Polished (DSP) substrate configuration is optional and can be specified upon placing your order.

5. What grade of silicon is used as the base substrate?

We strictly use high-quality Prime Grade Silicon to ensure low defect density and superior insulation performance.

6. How is the resistivity of the wafer determined?

Resistivity is tailored to your needs and will be specified and confirmed upon your custom order.