0102030405
6-Inch 150mm Thermal Oxide Silicon Wafer from China Suppliers - High-Quality Factory Direct Solution
Core Highlights
-
Precision-grown Thermal Oxide Wafer for advanced process applications.
-
Excellent mechanical strength and oxide adhesion.
-
Low particle contamination and surface roughness.
-
Suitable for IC, MEMS, and sensor fabrication.
-
Lead time: approximately 2 to 4 weeks.
Technical Specifications
Diameter
6 inch (150 mm)
Oxide Thickness
50–20000A
Oxide Type
Dry or Wet Thermal Oxidation
Substrate
Prime or Test Grade Silicon Wafer
Surface
Mirror-polished, single or both sides
Resistivity
Customizable
Frequently Asked Questions
What are the main applications for these Thermal Oxide Wafers?
These wafers are precision-grown for advanced process applications, making them highly suitable for Integrated Circuit (IC), MEMS, and sensor fabrication.
What options do you offer for oxide thickness and oxidation type?
We provide oxide thicknesses ranging from 50 to 20000A. Customers can choose between Dry or Wet Thermal Oxidation processes depending on their technical requirements.
Can I customize the resistivity of the silicon substrate?
Yes, the resistivity of our Prime or Test Grade Silicon Wafer substrates is fully customizable to meet your specific project needs.
What surface finishes are available for the 6-inch wafers?
Our wafers feature a mirror-polished surface finish, which can be configured for either single-sided or double-sided polishing.
What is the typical lead time for ordering these wafers?
The estimated lead time for manufacturing and delivery is approximately 2 to 4 weeks, ensuring low particle contamination and high mechanical strength.
